简介:摘要金刚石具有许多优异的性能,但天然金刚石的价格也比较昂贵。金刚石薄膜的各种性质与天然金刚石几乎相同,具有非常广阔的工业前景。本文采用乙醇和氢气作为工作气源,利用微波等离子体化学气相沉积法,在较低的温度下制备了金刚石薄膜,并研究了乙醇浓度、反应气压对金刚石薄膜生长的影响。
简介:Amorphouscalciumphosphatenano-powdersmadefromradiofiequency(RF)plasmaspraying;Anadvancedmodelforplasmasprayingoffunctionallygradedmaterials;AnestimateofthetemperatureofsemitransparentoxideparticlesinthermalSpraying;BioactivityofPlasmaSprayedWollastoniteCoatingsinSimulatedBodyFluid
简介:[篇名]Aradiologicalfollow-upstudyofplasma-sprayedfluorapatite(FA)coatings,[篇名]ARamanStudyonPlasma-SprayedThin-realBarrierCoatingsDuringThermalCycling,[篇名]AbrasionandSlidingWearofNanostructuredCeramicCoatings,[篇名]Abrasionbehaviorinnanostructuredalumina-titaniacoatings,[篇名]Al{sub}2O{sub}3/YAGcompositecoatingpreparedbyplasmasprayprocess,[篇名]Aluminareinforcedstainlesssteelcoatingsbyplasmasprayingmechanofusedparticles,[篇名]Aluminumbasednanostructuredcompositecoatings:processingmicrostructureandwearbehavior.
简介:摘要:随着土壤、沉积物的检测任务量的不断提高,一种普适性强、检测成本低、可适用于水系沉积物中V元素批量化处理的方法尤为重要。本文以中国地质科学院地球物理地球化学勘查研究所GBW07375(GSD-24)水系沉积物标准物质为研究对象,拟利用王水为提取液,使用超声水浴辅助提取水系沉积物中V,再使用等离子发射光谱法测试,通过控制不同的王水用量、水浴温度、提取时间建立一种可批量化处理、检测成本低、环境友好型的前处理方式,满足日益增加的检测任务量。而电感耦合等离子发射光谱法(ICP-OES)具有分析速度快、线性范围宽、可多元素同时检测等优点,已广泛应用于化工、环境、石油、矿产、冶金、生物、半导体、医学、材料分析等领域。超声水浴辅助王水提取水系沉积物中V辅以电感耦合等离子发射光谱法(ICP-OES)测试联合使用,可有效提高检测效率,节省检测成本,能极大地满足土壤、沉积物的批量化检测任务。
简介:AComputationalStudyofGasPhaseChemistryinCarbonNanotubeSynthessbyPECVD;AfieldpointbasedapproachforsensorconditioninginMO-CVDreactors;AMethodforReal-TimeControlofThinFilmCompositionUsingOESandXPS;Amechanism-basedmodelofchemicalvapordepositionofepitaxialSi{sub}(1-x)Ge{sub}xflirts
简介:[篇名]1.55-umsilicon-basedreflection-typewaveguide-integratedthermo-opticswitch,[篇名]120×90ElementThermoelectricInfraredFocalPlaneArraywithPreciselyPatternedAu-blackAbsorber,[篇名]4H-SiCEpitaxialGrowthfcrHigh-PowerDevices,[篇名]A90nmgenerationcopperdualdamascenetechnologywithALDTaNbarrier,[篇名]Acomparativemicrotribologicalinvestigationofdiamond-likecarbonfilmsforapplicationsinmicrosystems,[篇名]Acomparisonofmicrocrystailinesiliconpreparedbyplasma-enhancedchemicalvapordepositionandhot-wirechemicalvapordeposition:electronicanddeviceproperties.