简介:SomenewresultsofimplantdisorderingonInPbasedMQWstructuresbyim-plantedcompositionaldisorderingarepresented.TheenergyshiftofPLpeakdependsonionspecies,iondose,annealingconditionsandtargettemperature,TheresultsindicatethatthenonactiveionssuchasF^+andNe^+arethebestcandiatesforIICD,theiondosewhichcausedbiggestblueshiftisaround1×10^14cm^-2forroomtemperatureimplantationand5×10^14cm^-2foranelevatedimplantedtemperatureof200℃andtheoptimumannealingconditionisapproximately750℃for30s.AESandTEMcharacterizationsuggeststhationbombardmentbynonelectricallyactiveionssuchasF^+,Ne^+inducedsameamountoflayerinterdiffusionwhichresultsinthebandgapblueshiftduetothecompositionalchanges.
简介:ThedarkcurrentofIn0.47Ga0.53As/InPheterojunctionphotodiodes(HPDs)wasanalysed.Wefoundthatthereexistsanewdarkcurrentcompo-nent-deeplevel-assistedtunnelingcurrent.DLTSwasusedtomeasuretheIn0.47Ga0.53As/InPHPDs.Anelectronictrapwhichhasathermalactivationenergyof0.44eV,levelconcentrationof3.10×10^13cm^-3andelectroniccapturecrosssec-tionof1.72×10^12cm^2hasbeenfound.It^ˊsexistenceresultsinthenewtunnelingcurrent.
简介:利用室温光致荧光谱(PL)研究金属有机物化学气相沉积(MOCVD)方法中温度参数对InP衬底上生长In0.53Ga0.47As/InP量子阱材料质量的影响.通过两组实验分别研究并分析了生长温度对In0.53Ga0.47As层和InP层材料质量的影响,得到了In0.53Ga0.47As层和InP层最佳生长温度分别为650℃和600℃.利用优化条件制备In0.53Ga0.47As/InP基PIN型探测器,得到器件的暗电流较优化前小2个数量级.
简介:AsimulationmethodforthethermalanalysisofInAlAs/InGaAs/InPmid--infraredquantumcascadelasers(QCLs)basedonfinite--elementmethod(FEM)ispresented.ThethermaldistributionoftheQCLsonsubstrate--sideorepilayer--sidemountingformsissimulatedandtheresultsarecompared.Resultsshowthattheepilayer--sidemountingformhasmuchbetterheatdissipationcapabilitythanthesubstrate--sidemounting.
简介:InGaAs/InPavalanchephotodiodestypicallyworkinthegatedGeigermodetoachievenear-infraredsinglephotondetection.Byusingultrashortgatesandcombiningwiththerobustspike-cancelingtechniquethatconsistsofthecapacitance-balancingandlow-passfilteringtechnique,wedemonstrateanInGaAs/InPsingle-photondetector(SPD)withwidelytunablerepetitionratesinthispaper.Theoperationfrequencycouldbetunedconvenientlyfrom100MHzto1.25GHzwiththeSPD’sperformancemeasuredtomaintaingoodperformance,makingitquitesuitableforquantumkeydistribution,laserranging,andopticaltimedomainreflectometry.Furthermore,theSPDexhibitedextremelylow-noisecharacteristics.ThedetectionefficiencyofthisSPDcouldreach20%withthedarkcountrateof2.5×10-6∕gateandafter-pulseprobabilityof4.1%at1GHz.
简介:对比了ICP刻蚀和湿法腐蚀制备台面型InP/InGaAs雪崩光电二极管(APD)时侧壁、表面形貌的不同,以及对暗电流和击穿电压的影响。在Cl2/Ar2/CH4条件下感应耦合等离子体(ICP)刻蚀InP会出现表面粗糙,对其原因进行了探究。并主要对ICP的刻蚀时间和刻蚀功率进行了优化,提高刻蚀表面的温度,保证了刻蚀的稳定性并改善了InP刻蚀表面的形貌,确定了稳定制备APD器件的刻蚀条件,最终制备出性能优良的台面型APD器件。
简介:ThemethodsforprotectingInPsurfaceagainstdegradationduringannealing,includingencapsulantandencpsulant-freetechniques;rapidthermalan-nealingofInPimplantedlayers;implantedionspeciesandsomeprofilesoftypicaldopants,etc.,theyareallthekeytechniquesconcerningionimplantationintose-mi-insulatingInP,andhavebeenreviewedsyntheticallyaswell.
简介:InPintegratedphotonicshasbecomeacriticalenablerformoderntelecommunications,andispoisedtorevolutionizedatacommunications,precisionmetrology,spectrometry,andimaging.Thepossibilitytointegratehigh-performanceamplifiers,lasers,modulators,anddetectorsincombinationwithinterferometerswithinonechipisenablinggame-changingperformanceadvances,energysavings,andcostreductions.Genericintegrationacceleratesprogressthroughtheseparationofapplicationsfromacommontechnologydevelopment.Inthispaper,wereviewthecurrentstatusinInPintegratedphotonicsandtheeffortstointegratethenextgenerationofhigh-performancefunctionalityonacommonsubstrateusingthegenericmethodology.
简介:Weproposethatnanomaterialsareusedforfibers.Anovelnano-InPdopedfiberhasbeenfabricatedbythemethodofmodifiedchemicalvapordeposition(MCVD).Ithasbeenmeasuredthatthedopingconcentrationofphosphoruselementis0.1%.TherelationshipbetweenrefractiveindexandthewavelengthisobtainedbyfittingexperimentaldatatoSellmeierequation.Dispersionofthefiberhasbeencalculatedinthewavelengthrangeof1.2-1.6μm.Asthewavelengthvariesfrom1.20μmto1.60μm,dispersionparamete...
简介:High-strainInGaAs/GaAsquantumwells(QWs)aregrownbylow-pressuremetal-organicchemicalvapordeposition(LP-MOCVD).Photoluminescence(PL)atroomtemperatureisappliedforevaluationoftheopticalproperty.Theinfluenceofgrowthtemperature,V/IIIratio,andgrowthrateonPLcharacteristicareinvestigated.ItisfoundthatthegrowthtemperatureandV/IIIratiohavestrongeffectsonthepeakwavelengthandPLintensity.Thefull-widthathalf-maximum(FWHM)ofPLpeakincreaseswithhighergrowthrateofInGaAslayer.TheFWHMofthePLpeaklocatedat1039nmis20.1meV,whichgrowsat600°CwithV/IIIratioof42.7andgrowthrateof0.96mm/h.
简介:WehavemeasuredthedeepenergyleveloftheInP:Fewhichissemi-insulatorthroughthemethodofOTCS.TheeffectoflightintensityonOTCSmeasurementismainlydiscussed.ThereareelectrontrapofET=0.034eVandholetrapofET=1.13eVinInP:Feunderthestronglightandlowtemperature.ThelocationoftheOTCSpeakofelectrontrap(ET=0.34eV)movestowardsthedirectionofhightemperaturer,whenthelightintensitywasincreased,ETisdifferentunderdifferentlightintensity.Itiscorrectedintermsoftheorythatthestuffratioofthedeepenergylevelisaffectedbythelightintensity.Theexperimentsshowthattheerrorisdecreasedgreatlywiththecorrection.
简介:Zinchasbeendiffusedinton-typeInxGa1-xAs,InPandGaAsinclosedam-poules,andtheexperimentaldataforInxGa1-xAsrarelyreportedpreviouslyhavebeenob-tained,TheoreticallythelinearrelationsipbetweenlogarithmicdiffusioncoefficientlnDandthecompositionxhasbeendemonstrated,whichisingoodagreementwiththeexperimentalresults.ThecalculateddiffusionjunctiondepthforInGaAsbasedonthediffusionmodelinwhichD^∝c^2isassumedalsoagreeswellwiththatoftheexperment,Finallytheoveralldiffusiontimeinamultiayerheterostructurewasapproximatedast=(∑√-ti)^2.
简介:WestudythroughelectromagneticmodelingtheabsorptionoflightofagivenwavelengthinanarrayofhorizontalInPnanowiresofdiameterlessthan100nm.Suchabsorptionisperformedmostefficientlybyusingpolarizedlightandbyexcitingacoupledopticalresonanceinasparsearray.Inthatcase,weexcitearesonanceintheindividualnanowiresandcoupletheresonancesinneighboringnanowiresthroughalatticeresonanceoftheperiodicarray.Atsucharesonance,anarraywithnanowiresof80nmindiametercanabsorbmorethaneighttimesmorestronglythanatight-packedarray,despitecontainingaseventimessmalleramountoftheabsorbingInPmaterial.