Thisspecialissuecontainsselectedpapersfromthe2016NationalConferenceonHighVoltageandDischargePlasmas(HVDP),whichwashostedbythePlasmasandtheirApplicationsCommittee,ChinaElectrotechnicalSociety,andheldinBeijing,China,on26and27November2016.Theconferencewasattendedbyover430delegatesfrom110universities,researchinstitutesandenterprises.Intotal,280abstractsand132fullpapershavebeensubmitted,givingawonderfulassemblyoftechnicalcontributionsfromaroundChina.
