简介:AnomalousLeakageCurrentinSilicon0xynitrideThinFilmsGrownbyMicrowaveExcitedNitrogenPlasmaNitridation.Applicationoftheexplosivemethodforcreatingnitrogenlayers;Brightplasmanitridingofferriticsteelwithseveralalloyingelements;Cleaningasthemostimportantsteptowardssuccessfulheattreatment
简介:[篇名]ActivatedMigrationSintering,[篇名]Activationofsteelsurfacesbyoxynitriding,[篇名]Activescreenplasmanitridingtechnology,[篇名]AdvancedPlasmaNitridingforAluminumandAluminumAlloys,[篇名]Ananti-corrosionandwear-resistingcompoundingnitridedlayeronprecisepressedpartsofsoftsteels,[篇名]Anexperimentalstudytocorrelatewaterjetimpingementerosionresistanceandpropertiesofmetallicmaterialsandcoatings,[篇名]AnInfluenceofSonBombardingontheEffectsofNitridinginD.C.GlowDischargePlasma。
简介:[篇名]InfluenceofWCadditionanmicrostructuresoflaser-meltedNi-basedalloycoating,[篇名]MicrostructureanddryslidingwearbehavioroflasercladNi-basedalloycoatingwiththeadditionofSiC,[篇名]PreparationofAdvancedLithiumSecondaryBatterieswithTin-IronAlloyPlatingAnodesandTheirCharge-DischargeBehaviors,[篇名]SnAg-alloycoatingforconnectorsandsolderingapplications,[篇名]Structureandpropertiesofwear-resistanttitaniumcarbonitride-basedcoatings,[篇名]TheanalysisofthedepositionmechanismofZn/NialloyplatingusinganEQCM,[篇名]Theeffectofheattreatmentonwearresistanceofpartshavinghard-alloycoating.
简介:AdvancedLithiumSecondaryBatteriesUsingTin-IronAlloyNegativeElectrodesPreparedbyElectroplating;CavitationerosionofTi-Nishapememoryalloycoating;Effectsoffueldyeonthehotcorrosionresistanceofmarinegasturbinematerials;EffectsofphosphorouscontentsandambienthumidityonthefrictionandwearpropertiesofNi-W-PalloyplatingFrictionandwearofelectrolessNialloyplatedgearundernon-lubricationconditioninhighvacuum
简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.