简介：Frequency-doubledantireflectioncoatingssimultaneouslyeffectiveat1064nmand532nmweredepositedonthelithiumtriborate(LiB3O5orLBO)crystalsusingtheelectronbeamevaporationmethod.Comparingwiththesamplewithoutbufferlayer,itisfoundthattheadhesionofthesamplewithbufferlayerofSiO2betweencoatingandLBOsubstrateisimprovedsignificantlyfrom137.4mNtogreaterthan200mN.Andthelaser-induceddamagethresholdisincreasedby20%from15.1J/cm2to18.6J/cm2.ThestrengtheningmechanismofadhesionofthebufferlayerofSiO2isdiscussedbyconsideringfullplasticindentationandsheartheory.
客服QQ：30444492琼网文【2021】1550-113号
增值电信业务经营许可证：琼B2-20210322
出版物经营许可证：新出发龙华出字第(2021)009号
广播电视节目制作经营许可证：(琼)字第00779号
版权所有 ©2002-2024 期刊网(www.qikanchina.com) 琼ICP备2021005105号
