Thermodynamic Analysis of Chemical Vapor Deposition of BCl_3-NH_3-SiCl_4-H_2-Ar System

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摘要 ThethermodynamicphasestabilityareadiagramsofBCl3-NH3-SiCl4-H2-ArsystemwereplottedviaFactsagesoftwaretopredictthekineticexperimentalresults.Theeffectsofparameters(ie,partialpressureofreactants,depositiontemperatureandtotalpressure)onthedistributionregionsofsolidphaseproductswereanalyzedbasedonthediagrams.Theresultsshowthat:(a)Solidphaseproductsaremainlyaffectedbydepositiontemperature.TheareaofBN+Si3N4phaseincreaseswiththetemperaturerisingfrom650to900℃,anddecreaseswiththetemperaturerisingfrom900to1200℃;(b)Whentemperatureandtotalpressureareconstants,BN+Si3N4phaseexistsatahighpartialpressureofNH3;(c)Theeffectoftotalsystempressureiscorrelatedtodepositiontemperature.Thetemperaturerangingfrom700to900℃underlowtotalpressureistheoptimumconditionforthedeposition.(d)Appropriatekineticparameterscanbedeterminedbasedontheresultsofthermodynamiccalculation.Si–B–Ncoatingisobtainedvialowpressurechemicalvapordeposition.TheanalysisbyX-rayphotoelectronspectroscopyindicatesthatB–NandSi–Narethemainchemicalbondsofthecoating.
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出版日期 2015年05月15日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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